Tomohiko YAMAKAMI


Model Calculation for the Field Enhancement Factor of Carbon Nanowall Array
Tomohiko YAMAKAMI Masahiro YAMASHITA Rinpei HAYASHIBE Kiichi KAMIMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2011/12/01
Vol. E94-C  No. 12  pp. 1867-1871
Type of Manuscript:  Special Section PAPER (Special Section on Recent Progress in Organoelectronic Materials and Their Applications for Nanotechnology)
Category: 
Keyword: 
field emissionfield enhancement factornanowall
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Interface State Density between Direct Nitridation Layer and SiC Estimated from Current Voltage Characteristics of MIS Schottky Diode
Kiichi KAMIMURA Hiroaki SHIOZAWA Tomohiko YAMAKAMI Rinpei HAYASHIBE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2009/12/01
Vol. E92-C  No. 12  pp. 1470-1474
Type of Manuscript:  Special Section PAPER (Special Section on Nanomaterials and Nanodevices for Nanoscience and Nanotechnology)
Category: Fundamentals for Nanodevices
Keyword: 
SiCnitrideinterfaceMIS Schottky
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Preparation of Cuprous Oxide (Cu2O) Thin Films by Reactive DC Magnetron Sputtering
Kiichi KAMIMURA Haruki SANO Katsuya ABE Rinpei HAYASHIBE Tomohiko YAMAKAMI Masato NAKAO Yoshiharu ONUMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2004/02/01
Vol. E87-C  No. 2  pp. 193-196
Type of Manuscript:  Special Section PAPER (Special Section on Recent Progress in Oxide Thin Films by Sputtering)
Category: 
Keyword: 
Cu2Oreactive sputteringthin film
 Summary | Full Text:PDF