Tetsuya UCHIDA


3-D Topography and Impurity Integrated Process Simulator (3-D MIPS) and Its Applications
Masato FUJINAGO Tatsuya KUNIKIYO Tetsuya UCHIDA Eiji TSUKUDA Kenichiro SONODA Katsumi EIKYU Kiyoshi ISHIKAWA Tadashi NISHIMURA Satoru KAWAZU 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1999/06/25
Vol. E82-C  No. 6  pp. 848-861
Type of Manuscript:  Special Section PAPER (Special Issue on TCAD for Semiconductor Industries)
Category: 
Keyword: 
LSI fabricationprocess simulatortopographyimpurity diffusionsegregationcapacitance
 Summary | Full Text:PDF

Oblique Rotating Ion Implantation Simulation for the Drain Formation of Gate/N- Overlapped LDD MOSFET's Using the Monte Carlo Method
Tatsuya KUNIKIYO Masato FUJINAGA Tetsuya UCHIDA Norihiko KOTANI Yoichi AKASAKA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1991/06/25
Vol. E74-C  No. 6  pp. 1662-1671
Type of Manuscript:  Special Section PAPER (Special Issue on Device and Process Simulation for Ultra Large Scale Integration)
Category: 
Keyword: 
 Summary | Full Text:PDF