Takeshi FURUKAWA


Deposition of High-Quality Silicon Dioxide by Remote Plasma CVD Technique
Takashi FUYUKI Takeshi FURUKAWA Tohru OKA Hiroyuki MATSUNAMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/09/25
Vol. E75-C  No. 9  pp. 1013-1018
Type of Manuscript:  Special Section PAPER (Special Issue on Silicon Devices and Materials)
Category: 
Keyword: 
remote plasma CVDSiO2
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