Takahisa HAYASHI


Tunnel Oxynitride Film Formation for Highly Reliable Flash Memory
Tomiyuki ARAKAWA Ryoichi MATSUMOTO Takahisa HAYASHI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/06/25
Vol. E79-C  No. 6  pp. 819-824
Type of Manuscript:  Special Section PAPER (Special Issue on ULSI Memory Technology)
Category: Nonvolatile memories
Keyword: 
flash memoryoxynitride tunnel filmendurancedisturbanceretention
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Highly Reliable Flash Memories Fabricated by in-situ Multiple Rapid Thermal Processing
Takahisa HAYASHI Yoshiyuki KAWAZU Akira UCHIYAMA Hisashi FUKUDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/08/25
Vol. E77-C  No. 8  pp. 1270-1278
Type of Manuscript:  Special Section PAPER (Special Section on High Speed and High Density Multi Functional LSI Memories)
Category: Non-volatile Memory
Keyword: 
electrically erasable programmable read-only memorymetal-oxide-semiconductor structuressiliconinsulating materials and insulatorspolysilicon
 Summary | Full Text:PDF