Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing
Kokoro KATO Masakazu ENDO Tadao INOUE Shigetoshi NAKATAKE Masaki YAMABE Sunao ISHIHARA 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2010/12/01
Vol. E93-A  No. 12  pp. 2424-2432
Type of Manuscript:  Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
Category: Device and Circuit Modeling and Analysis
Mask Data Rank (MDR)design intentDFMMDP
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