Shigenari TAGUCHI


Thickness Dependence of Furnace N2O-Oxynitridation Effects on Breakdown of Thermal Oxides
Toshimasa MATSUOKA Shigenari TAGUCHI Kenji TANIGUCHI Chihiro HAMAGUCHI Seizo KAKIMOTO Junkou TAKAGI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1995/03/25
Vol. E78-C  No. 3  pp. 248-254
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-1/4 Micron Device and Process Technologies)
Category: 
Keyword: 
N2O-oxynitridationcharge-to-breakdownthin dielectricsMOS structuredielectric reliability
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