Satoru YAMADA

An Area-Efficient, Low-VDD, Highly Reliable Multi-Cell Antifuse System Fully Operative in DRAMs
Jong-Pil SON Jin Ho KIM Woo Song AHN Seung Uk HAN Satoru YAMADA Byung-Sick MOON Churoo PARK Hong-Sun HWANG Seong-Jin JANG Joo Sun CHOI Young-Hyun JUN Soo-Won KIM 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2011/10/01
Vol. E94-C  No. 10  pp. 1690-1697
Type of Manuscript:  PAPER
Category: Integrated Electronics
Keyword: 
DRAM, antifuse, repair, post-package repair, recovery, 
 Summary | Full Text:PDF
Analysis of Boron Penetration and Gate Depletion Using Dual-Gate PMOSFETs for High Performance G-Bit DRAM Design
Norikatsu TAKAURA Ryo NAGAI Hisao ASAKURA Satoru YAMADA Shin'ichiro KIMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2002/05/01
Vol. E85-C  No. 5  pp. 1138-1145
Type of Manuscript:  Special Section PAPER (Special Issue on Microelectronic Test Structures)
Category: 
Keyword: 
boron penetration, gate depletion, dual-gate PMOSFETs, Vth fluctuation, G-bit DRAM, 
 Summary | Full Text:PDF
High-Resolution Wafer Inspection Using the "in-lens SEM"
Fumio MIZUNO Satoru YAMADA Tadashi OHTAKA Nobuo TSUMAKI Toshifumi KOIKE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3  pp. 317-323
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: Particle/Defect Control and Analysis
Keyword: 
semiconductor devices, wafer inspection, scanning electron microscope, objective lens, eucentric stage, acoustic motor, spatial resolution, line-width measurement, BEASTLI, 
 Summary | Full Text:PDF
Effects of 50 to 200-keV Electrons by BEASTLI Method on Semiconductor Devices
Fumio MIZUNO Satoru YAMADA Tsunao ONO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3  pp. 392-397
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: Device Issues
Keyword: 
semiconductor devices, wafer inspection, scanning electron microscope, high-energy electron beam, device damage, surface charging, BEASTLI, 
 Summary | Full Text:PDF
Precise Linewidth Measurement Using a Scanning Electron Probe
Fumio MIZUNO Satoru YAMADA Akihiro MIURA Kenji TAKAMOTO Tadashi OHTAKA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4  pp. 600-606
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
LSI, metrology system, scanning electron probe, measurement accuracy, reproducibility, linearity, repeatability, 
 Summary | Full Text:PDF