Satoru YAMADA


An Area-Efficient, Low-VDD, Highly Reliable Multi-Cell Antifuse System Fully Operative in DRAMs
Jong-Pil SON Jin Ho KIM Woo Song AHN Seung Uk HAN Satoru YAMADA Byung-Sick MOON Churoo PARK Hong-Sun HWANG Seong-Jin JANG Joo Sun CHOI Young-Hyun JUN Soo-Won KIM 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2011/10/01
Vol. E94-C  No. 10  pp. 1690-1697
Type of Manuscript:  PAPER
Category: Integrated Electronics
Keyword: 
DRAMantifuserepairpost-package repairrecovery
 Summary | Full Text:PDF

Analysis of Boron Penetration and Gate Depletion Using Dual-Gate PMOSFETs for High Performance G-Bit DRAM Design
Norikatsu TAKAURA Ryo NAGAI Hisao ASAKURA Satoru YAMADA Shin'ichiro KIMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2002/05/01
Vol. E85-C  No. 5  pp. 1138-1145
Type of Manuscript:  Special Section PAPER (Special Issue on Microelectronic Test Structures)
Category: 
Keyword: 
boron penetrationgate depletiondual-gate PMOSFETsVth fluctuationG-bit DRAM
 Summary | Full Text:PDF

High-Resolution Wafer Inspection Using the "in-lens SEM"
Fumio MIZUNO Satoru YAMADA Tadashi OHTAKA Nobuo TSUMAKI Toshifumi KOIKE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3  pp. 317-323
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: Particle/Defect Control and Analysis
Keyword: 
semiconductor deviceswafer inspectionscanning electron microscopeobjective lenseucentric stageacoustic motorspatial resolutionline-width measurementBEASTLI
 Summary | Full Text:PDF

Effects of 50 to 200-keV Electrons by BEASTLI Method on Semiconductor Devices
Fumio MIZUNO Satoru YAMADA Tsunao ONO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3  pp. 392-397
Type of Manuscript:  Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: Device Issues
Keyword: 
semiconductor deviceswafer inspectionscanning electron microscopehigh-energy electron beamdevice damagesurface chargingBEASTLI
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Precise Linewidth Measurement Using a Scanning Electron Probe
Fumio MIZUNO Satoru YAMADA Akihiro MIURA Kenji TAKAMOTO Tadashi OHTAKA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4  pp. 600-606
Type of Manuscript:  Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
LSImetrology systemscanning electron probemeasurement accuracyreproducibilitylinearityrepeatability
 Summary | Full Text:PDF