| Robert W. DUTTON
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TCAD--Yesterday, Today and Tomorrow Robert W. DUTTON | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1999/06/25
Vol. E82-C
No. 6
pp. 791-799
Type of Manuscript:
INVITED PAPER (Special Issue on TCAD for Semiconductor Industries) Category: Keyword: TCAD, device simulation, process simulation, IC technology, diffusion, ion implantation, oxidation, MOS scaling, modeling, hierarchy, atomic-scale phenomena, | | Summary | Full Text:PDF(482.5KB) | |
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