Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2014/05/01
Vol. E97-C
No. 5
pp. 413-418
Type of Manuscript:
Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category:
Keyword:
Si surface roughness, HfON gate insulator, ECR plasma sputtering, plasma oxidation, 1/f noise, TDDB, |
