Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2004/01/01
Vol. E87-C
No. 1
pp. 17-23
Type of Manuscript:
Special Section PAPER (Special Section on High-κ Gate Dielectrics)
Category:
Keyword:
high-κ gate dielectrics, HfO2, ALD, TEM, SIMS, XPS, FT-IR ATR, EXAFS, |
