Miyoko NOGUCHI


Sub-Half Micron Exposure System with Optimized Illumination
Akiyoshi SUZUKI Miyoko NOGUCHI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1  pp. 13-18
Type of Manuscript:  INVITED PAPER (Special Issue on Opto-Electronics and LSI)
Category: Opto-Electronics Technology for LSIs
Keyword: 
photolithographyresolutiondepth of focusilluminationquadrupole illumination
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