Kunihiko KASAMA


Sizes and Numbers of Particles Being Capable of Causing Pattern Defects in Semiconductor Device Manufacturing
Mototaka KAMOSHIDA Hirotomo INUI Toshiyuki OHTA Kunihiko KASAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/25
Vol. E79-C  No. 3  pp. 264-271
Type of Manuscript:  INVITED PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: 
Keyword: 
semiconductor device manufacturingparticlesizenumberpattern defect
 Summary | Full Text:PDF

Optimization of Optical Parameters in KrF Excimer Laser Lithography for Quarter-Micron Lines Pattern
Keiichiro TOUNAI Kunihiko KASAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3  pp. 425-431
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
KrF excimer steppermodified illuminationdepth of focussimulation
 Summary | Full Text:PDF