Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1994/03/25 Vol. E77-CNo. 3pp. 459-463 Type of Manuscript: Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies) Category: Process Technology Keyword: ion implantation, charge-up, electron shower, oxide, dielectric breakdown,
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1992/09/25 Vol. E75-CNo. 9pp. 972-977 Type of Manuscript: Special Section PAPER (Special Issue on Silicon Devices and Materials) Category: Keyword: ion implantation, LOCOS, isolation, channel stop, ITF,
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1992/09/25 Vol. E75-CNo. 9pp. 995-1000 Type of Manuscript: Special Section PAPER (Special Issue on Silicon Devices and Materials) Category: Keyword: ion implantation, phosphorus, diffusion, polycrystalline silicon,