Koichi MUTO

Characteristcs of Ga-Doped ZnO Films Prepared by RF Magnetron Sputtering in Ar+H2 Ambience
Koichi MUTO Satoru ODASHIMA Norimitsu NASU Osamu MICHIKAMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2008/10/01
Vol. E91-C  No. 10  pp. 1649-1652
Type of Manuscript:  Special Section PAPER (Special Section on Functional Thin Films for Optical Applications)
Ga-doped ZnO thin filmmagnetron sputteringAr+H2 gastransparent and conductive film
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