Kiyoshi NIKAWA


New Approach of Laser-SQUID Microscopy to LSI Failure Analysis
Kiyoshi NIKAWA Shouji INOUE Tatsuoki NAGAISHI Toru MATSUMOTO Katsuyoshi MIURA Koji NAKAMAE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2009/03/01
Vol. E92-C  No. 3  pp. 327-333
Type of Manuscript:  INVITED PAPER (Special Section on Recent Progress in Superconducting Analog Devices and Their Applications)
Category: 
Keyword: 
SQUIDlaserLSI chipfailure analysisdefect localization
 Summary | Full Text:PDF(1.5MB)

Laser-SQUID Microscopy as a Novel Tool for Inspection, Monitoring and Analysis of LSI-Chip-Defects: Nondestructive and Non-electrical-contact Technique
Kiyoshi NIKAWA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2002/03/01
Vol. E85-C  No. 3  pp. 746-751
Type of Manuscript:  INVITED PAPER (Special Issue on Superconductive Electronics)
Category: Instruments and Coolers
Keyword: 
high Tc DC-SQUIDoptical beam induced currentphoto currenthigh spatial resolutionelectrical defectsinspectionfailure analysis
 Summary | Full Text:PDF(417.1KB)

Highly Sensitive OBIRCH System for Fault Localization and Defect Detection
Kiyoshi NIKAWA Shoji INOUE 
Publication:   IEICE TRANSACTIONS on Information and Systems
Publication Date: 1998/07/25
Vol. E81-D  No. 7  pp. 743-748
Type of Manuscript:  Special Section PAPER (Special Issue on Test and Diagnosis of VLSI)
Category: Beam Testing/Diagnosis
Keyword: 
VLSI chipfault localizationmetal line defect detectionhigh resistivityTiSiAlreliabilityyieldfailure analysis
 Summary | Full Text:PDF(916.7KB)

Failure Analysis in Si Device Chips
Kiyoshi NIKAWA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/04/25
Vol. E77-C  No. 4  pp. 528-534
Type of Manuscript:  INVITED PAPER (Special Issue on LSI Failure Analysis)
Category: 
Keyword: 
EMMS (emission microscopy)OBIC (optical beam induced current)LCM (liquid crystal method)EBP (electron beam probing)FIB (focused ion beam method)expert systemscomputer aided fault localization tools
 Summary | Full Text:PDF(536.4KB)

Focused Ion Beam Applications to Failure Analysis of Si Device Chip
Kiyoshi NIKAWA 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 1994/01/25
Vol. E77-A  No. 1  pp. 174-179
Type of Manuscript:  Special Section PAPER (Special Section on Reliability)
Category: Failure Physics and Failure Analysis
Keyword: 
focused ion beam (FIB)scanning ion microscope (SIM)scanning electron microscope (SEM)transmission electron microscope (TEM)electron beam probing (EBP)microscopic cross-sectioning and observationmicroscopic crosssectioning and elemental analysisaluminum film microstructure observation
 Summary | Full Text:PDF(710.4KB)