Kiyoshi MORIMOTO


An Advanced 405-nm Laser Diode Crystallization Method of a-Si Film for Fabricating Microcrystalline-Si TFTs
Kiyoshi MORIMOTO Nobuyasu SUZUKI Kazuhiko YAMANAKA Masaaki YURI Janet MILLIEZ Xinbing LIU 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2011/11/01
Vol. E94-C  No. 11  pp. 1733-1738
Type of Manuscript:  INVITED PAPER (Special Section on Electronic Displays)
Category: 
Keyword: 
laser crystallization of a-Sithin film transistormicrocrystalline siliconheat flow simulation
 Summary | Full Text:PDF

Fabrication of Silicon Quantum Wires and Dots
Yoshihiko HIRAI Kiyoshi MORIMOTO Masaaki NIWA Koichiro YUKI Juro YASUI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/09/25
Vol. E77-C  No. 9  pp. 1426-1430
Type of Manuscript:  Special Section PAPER (Special Issue on Heterostructure Devices and Epitaxial Growth Techniques)
Category: 
Keyword: 
siliconquantum wirequantum dotanisotropic etching
 Summary | Full Text:PDF