Kimiyoshi DEGUCHI


A 0.25-µm BiCMOS Technology Using SOR X-Ray Lithography
Shinsuke KONAKA Hakaru KYURAGI Toshio KOBAYASHI Kimiyoshi DEGUCHI Eiichi YAMAMOTO Shigehisa OHKI Yousuke YAMAMOTO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3  pp. 355-361
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Device Technology
Keyword: 
BiCMOSX-ray lithographySORself-aligned bipolarmetallization
 Summary | Full Text:PDF

Effects of Synchrotron X-Ray Irradiation on Hot Carrier Reliability in Subquarter-Micrometer NMOSFETs
Toshiaki TSUCHIYA Mitsuru HARADA Kimiyoshi DEGUCHI Tadahito MATSUDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/25
Vol. E76-C  No. 4  pp. 506-510
Type of Manuscript:  INVITED PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Device Technology
Keyword: 
MOSFETreliabilityhot carriersynchrotron X-ray
 Summary | Full Text:PDF