Kengo FURUTANI


Estimation of Optimum Ion Energy for the Reduction of Resistivity in Bias Sputtering of ITO Thin Films
Kiyoshi ISHII Yoshifumi SAITOU Kengo FURUTANI Hiroshi SAKUMA Yoshito IKEDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2008/10/01
Vol. E91-C  No. 10  pp. 1653-1657
Type of Manuscript:  Special Section PAPER (Special Section on Functional Thin Films for Optical Applications)
Category: 
Keyword: 
tin-doped indium oxidetransparent thin filmITOsputtered filmgas flow sputtering
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