Kazuhiro KANDA


Low-Temperature Activation in Boron Ion-Implanted Silicon by Soft X-Ray Irradiation
Akira HEYA Naoto MATSUO Kazuhiro KANDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2016/04/01
Vol. E99-C  No. 4  pp. 474-480
Type of Manuscript:  PAPER
Category: Semiconductor Materials and Devices
Keyword: 
boron dopantlow-temperature activationsoft X-ray irradiationsheet resistanceelectron excitationdepth profile
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Fabrication of Diamond-Like Carbon Nanosprings by Focused-Ion-Beam Chemical Vapor Deposition and Evaluation of Their Mechanical Characteristics
Kenichiro NAKAMATSU Masao NAGASE Toshinari ICHIHASHI Kazuhiro KANDA Yuichi HARUYAMA Takashi KAITO Shinji MATSUI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2007/01/01
Vol. E90-C  No. 1  pp. 41-45
Type of Manuscript:  Special Section PAPER (Special Section on Microoptomechatronics)
Category: Micro/Nano Fabrication
Keyword: 
nanospringdiamond-like carbonfocused ion beamchemical vapor depositionmechanical characteristics
 Summary | Full Text:PDF