Jun KUDO


Evaluation of Si Surface Micro-Roughness by Measuring Chlorine Concentration and Total Charge of Native Oxide
Ichiro OKI Tetsuo BIWA Jun KUDO Hikou SHIBAYAMA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7  pp. 809-811
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
AFMSTMmicro-roughnessHCl/H2O2
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