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Ichiro OKI
Evaluation of Si Surface Micro-Roughness by Measuring Chlorine Concentration and Total Charge of Native Oxide
Ichiro OKI
Tetsuo BIWA
Jun KUDO
Hikou SHIBAYAMA
Publication:
IEICE TRANSACTIONS on Electronics
Publication Date:
1992/07/25
Vol.
E75-C
No.
7
pp.
809-811
Type of Manuscript:
Special Section PAPER (Special Issue on Ultra Clean Technology)
Category:
Keyword:
AFM
,
STM
,
micro-roughness
,
HCl/H
2
O
2
,
Summary
|
Full Text:PDF