Hiroshi NOHIRA


Initial Stage of SiO2/Si Interface Formation on Si(111) Surface
Hiroshi NOHIRA Yoshinari TAMURA Hiroki OGAWA Takeo HATTORI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7  pp. 757-763
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
oxidationsiliconH-terminationXPS
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