Hi-Deok LEE


Novel PNP BJT Structure to Improve Matching Characteristics for Analog and Mixed Signal Integrated Circuit Applications
Seon-Man HWANG Yi-Jung JUNG Hyuk-Min KWON Jae-Hyung JANG Ho-Young KWAK Sung-Kyu KWON Seung-Yong SUNG Jong-Kwan SHIN Yi-Sun CHUNG Da-Soon LEE Hi-Deok LEE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2013/05/01
Vol. E96-C  No. 5  pp. 663-668
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
bipolar junction transistor (BJT)matchinganalog applicationmatching coefficient
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Effects of Fluorine Implantation on 1/f Noise, Hot Carrier and NBTI Reliability of MOSFETs
Jae-Hyung JANG Hyuk-Min KWON Ho-Young KWAK Sung-Kyu KWON Seon-Man HWANG Jong-Kwan SHIN Seung-Yong SUNG Yi-Sun CHUNG Da-Soon LEE Hi-Deok LEE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2013/05/01
Vol. E96-C  No. 5  pp. 624-629
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
fluorineflicker noise1/f noisereliabilityhot-carrierNBTIMOSFET
 Summary | Full Text:PDF

Comparative Analysis of Bandgap-Engineered Pillar Type Flash Memory with HfO2 and S3N4 as Trapping Layer
Sang-Youl LEE Seung-Dong YANG Jae-Sub OH Ho-Jin YUN Kwang-Seok JEONG Yu-Mi KIM Hi-Deok LEE Ga-Won LEE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2012/05/01
Vol. E95-C  No. 5  pp. 831-836
Type of Manuscript:  Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
SOHOShigh-kgate-all-aroundprogram/erase speedflash memory
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High Transport Si/SiGe Heterostructures for CMOS Transistors with Orientation and Strain Enhanced Mobility
Jungwoo OH Jeff HUANG Injo OK Se-Hoon LEE Paul D. KIRSCH Raj JAMMY Hi-Deok LEE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2011/05/01
Vol. E94-C  No. 5  pp. 712-716
Type of Manuscript:  INVITED PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: 
Keyword: 
high transportSiGeorientationstrainheterostructure
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Thermally Robust Nickel Silicide Process for Nano-Scale CMOS Technology
Soon-Young OH Jang-Gn YUN Bin-Feng HUANG Yong-Jin KIM Hee-Hwan JI Sang-Bum HUH Han-Seob CHA Ui-Sik KIM Jin-Suk WANG Hi-Deok LEE 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2005/04/01
Vol. E88-C  No. 4  pp. 651-655
Type of Manuscript:  Special Section PAPER (Special Section on Fundamental and Application of Advanced Semiconductor Devices)
Category: Si Devices and Processes
Keyword: 
Ni-silicidebi-layer cappingternary phasenano-scale MOSFET
 Summary | Full Text:PDF