Hannes STIPPEL


Monte Carlo Simulation of Ion Implantation for Three-Dimensional Structures Using an Octree
Hannes STIPPEL Siegfried SELBERHERR 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/02/25
Vol. E77-C  No. 2  pp. 118-123
Type of Manuscript:  Special Section PAPER (Special Issue on 1993 VLSI Process and Device Modeling Workshop (VPAD 93))
Category: Process Simulation
Keyword: 
ion implantationMonte Carlo methodpoint locationoctree
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