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Three-Dimensional Triangle-Based Simulation of Etching Processes and Applications Oliver LENHART Eberhard BAR | Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2003/03/01
Vol. E86-C
No. 3
pp. 427-432
Type of Manuscript:
Special Section PAPER (Special Issue on the 2002 IEEE International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'02)) Category: Keyword: process simulation, etching, 3D string algorithm, surface mesh, | | Summary | Full Text:PDF(991.1KB) | |
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