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Akira YOSHIDA

Advances in High-T_c Single Flux Quantum Device Technologies Keiichi TANABE Hironori WAKANA Koji TSUBONE Yoshinobu TARUTANI Seiji ADACHI Yoshihiro ISHIMARU Michitaka MARUYAMA Tsunehiro HATO Akira YOSHIDA Hideo SUZUKI
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2008/03/01 Vol. E91-C No. 3 pp. 280-292 Type of Manuscript: INVITED PAPER (Special Section on Recent Progress in Superconductive Digital Electronics) Category: Keyword: superconducting device, single flux quantum device, mixed signal device, high-temperature superconductor,
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Superconductor/Semiconductor Hybrid Analog-to-Digital Converter Futoshi FURUTA Kazuo SAITOH Akira YOSHIDA Hideo SUZUKI
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2008/03/01 Vol. E91-C No. 3 pp. 356-363 Type of Manuscript: Special Section PAPER (Special Section on Recent Progress in Superconductive Digital Electronics) Category: Keyword: analog-to-digital converter (ADC), sigma-delta modulator, superconductor/semiconductor hybrid architecture,
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From Intraspecific Learning to Interspecific Evolution by Genetic Programming Akira YOSHIDA
Publication: IEICE TRANSACTIONS on Information and Systems Publication Date: 2002/01/01 Vol. E85-D No. 1 pp. 243-254 Type of Manuscript: PAPER Category: Artificial Intelligence, Cognitive Science Keyword: genetic programming, learning and evolution, artificial life, behavior of social insect, territory,
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Developments of GaN Bulk Substrates for GaN Based LEDs and LDs Osamu ODA Takayuki INOUE Yoji SEKI Akihiro WAKAHARA Akira YOSHIDA Satoshi KURAI Yoichi YAMADA Tsunemasa TAGUCHI
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2000/04/25 Vol. E83-C No. 4 pp. 639-646 Type of Manuscript: Special Section PAPER (Special Issue on Blue Laser Diodes and Related Devices/Technologies) Category: Keyword: GaN, HVPE, epitaxial growth, solution growth,
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Plasmaless Dry Etching of Silicon Nitride Films with Chlorine Trifluoride Gas Yoji SAITO Masahiro HIRABARU Akira YOSHIDA
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 1992/07/25 Vol. E75-C No. 7 pp. 834-838 Type of Manuscript: Special Section PAPER (Special Issue on Ultra Clean Technology) Category: Keyword: silicon nitride film, plasmaless etching, chlorine trifuoride gas, ultra-violet light irradiation,
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