Akira YOSHIDA

Advances in High-Tc Single Flux Quantum Device Technologies
Keiichi TANABE Hironori WAKANA Koji TSUBONE Yoshinobu TARUTANI Seiji ADACHI Yoshihiro ISHIMARU Michitaka MARUYAMA Tsunehiro HATO Akira YOSHIDA Hideo SUZUKI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2008/03/01
Vol. E91-C  No. 3  pp. 280-292
Type of Manuscript:  INVITED PAPER (Special Section on Recent Progress in Superconductive Digital Electronics)
Category: 
Keyword: 
superconducting device, single flux quantum device, mixed signal device, high-temperature superconductor, 
 Summary | Full Text:PDF
Superconductor/Semiconductor Hybrid Analog-to-Digital Converter
Futoshi FURUTA Kazuo SAITOH Akira YOSHIDA Hideo SUZUKI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2008/03/01
Vol. E91-C  No. 3  pp. 356-363
Type of Manuscript:  Special Section PAPER (Special Section on Recent Progress in Superconductive Digital Electronics)
Category: 
Keyword: 
analog-to-digital converter (ADC), sigma-delta modulator, superconductor/semiconductor hybrid architecture, 
 Summary | Full Text:PDF
From Intraspecific Learning to Interspecific Evolution by Genetic Programming
Akira YOSHIDA 
Publication:   IEICE TRANSACTIONS on Information and Systems
Publication Date: 2002/01/01
Vol. E85-D  No. 1  pp. 243-254
Type of Manuscript:  PAPER
Category: Artificial Intelligence, Cognitive Science
Keyword: 
genetic programming, learning and evolution, artificial life, behavior of social insect, territory, 
 Summary | Full Text:PDF
Developments of GaN Bulk Substrates for GaN Based LEDs and LDs
Osamu ODA Takayuki INOUE Yoji SEKI Akihiro WAKAHARA Akira YOSHIDA Satoshi KURAI Yoichi YAMADA Tsunemasa TAGUCHI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2000/04/25
Vol. E83-C  No. 4  pp. 639-646
Type of Manuscript:  Special Section PAPER (Special Issue on Blue Laser Diodes and Related Devices/Technologies)
Category: 
Keyword: 
GaN, HVPE, epitaxial growth, solution growth, 
 Summary | Full Text:PDF
Plasmaless Dry Etching of Silicon Nitride Films with Chlorine Trifluoride Gas
Yoji SAITO Masahiro HIRABARU Akira YOSHIDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7  pp. 834-838
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
silicon nitride film, plasmaless etching, chlorine trifuoride gas, ultra-violet light irradiation, 
 Summary | Full Text:PDF