Akira OHSAWA


Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning
Rinshi SUGINO Yoshiko OKUI Masaki OKUNO Mayumi SHIGENO Yasuhisa SATO Akira OHSAWA Takashi ITO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/07/25
Vol. E75-C  No. 7  pp. 829-833
Type of Manuscript:  Special Section PAPER (Special Issue on Ultra Clean Technology)
Category: 
Keyword: 
dry cleaningiron and aluminumsilicon surfacechlorine radicalatomic absorption spectrophotometry
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