Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2011/05/01 Vol. E94-CNo. 5pp. 717-723 Type of Manuscript: Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices) Category: Keyword: high-k gate dielectrics, capping layer, HfO2, MgO, photoemission measurements,
Publication: IEICE TRANSACTIONS on Electronics Publication Date: 2011/05/01 Vol. E94-CNo. 5pp. 699-704 Type of Manuscript: Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices) Category: Keyword: ReRAM, TiO2, low temperature, H2 annealing, charge trapping,