A Defect Position Identification Method through Dual Channel System for Flat Panel Manufacturing Processes

Hiroshi HAMORI  Masatoshi SAKAWA  Hideki KATAGIRI  Takeshi MATSUI  

Publication
C - Abstracts of IEICE TRANSACTIONS on Electronics (Japanese Edition)   Vol.J94-C   No.10   pp.323-333
Publication Date: 2011/10/01
Online ISSN: 1881-0217
DOI: 
Print ISSN: 1345-2827
Type of Manuscript: PAPER
Category: 
Keyword: 
flat panel display,  defect inspection,  repair,  high-speed,  

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Summary: 
Research of the inspection and defect repair process for improving the production yield is becoming more important in the flat panel production process which remarkably expands in recent years. In this research, a new inspection method involving the fast and accurate defect position identification of electrical defects to be repaired in a-Si TFT circuits is proposed. The earlier inspection method through single channel system lacks the stability of defect detection due to external electrical noises as well as mechanical vibrations. In addition, it is difficult for it to detect incomplete defects between defect wirings and normal ones. The proposed method through dual channel system has overcome those weaknesses that were major issues in the area. Furthermore, the speed of inspection can be improved by employing new algorithms. As a result, both the time of inspection process and that of repair process after defect detection can be drastically reduced.