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A Defect Position Identification Method through Dual Channel System for Flat Panel Manufacturing Processes
Hiroshi HAMORI Masatoshi SAKAWA Hideki KATAGIRI Takeshi MATSUI
C - Abstracts of IEICE TRANSACTIONS on Electronics (Japanese Edition)
Publication Date: 2011/10/01
Online ISSN: 1881-0217
Print ISSN: 1345-2827
Type of Manuscript: PAPER
flat panel display, defect inspection, repair, high-speed,
Full Text(in Japanese): PDF(1.6MB)
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Research of the inspection and defect repair process for improving the production yield is becoming more important in the flat panel production process which remarkably expands in recent years. In this research, a new inspection method involving the fast and accurate defect position identification of electrical defects to be repaired in a-Si TFT circuits is proposed. The earlier inspection method through single channel system lacks the stability of defect detection due to external electrical noises as well as mechanical vibrations. In addition, it is difficult for it to detect incomplete defects between defect wirings and normal ones. The proposed method through dual channel system has overcome those weaknesses that were major issues in the area. Furthermore, the speed of inspection can be improved by employing new algorithms. As a result, both the time of inspection process and that of repair process after defect detection can be drastically reduced.