Application of Technology CAD in Process Development for High Performance Logic and System-on-Chip in IC Foundry

Boon-Khim LIEW  Chih-Chiang WANG  Carlos H. DIAZ  Shien-Yang WU  Jack Yuan-Chen SUN  Yai-Fen LIN  Di-Son KUO  Hua-Tai LIN  Anthony YEN  

Publication
IEICE TRANSACTIONS on Electronics   Vol.E83-C   No.8   pp.1275-1280
Publication Date: 2000/08/25
Online ISSN: 
DOI: 
Print ISSN: 0916-8516
Type of Manuscript: INVITED PAPER (Special Issue on 1999 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'99))
Category: Simulation Methodology and Environment
Keyword: 
TCAD,  CMOS device,  flash,  optical proximity correction,  

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Summary: 
The application of Technology CAD simulations for development of IC processes in foundry is presented. Examples include device design, Flash cell design and optical proximity correction for SRAM cell. The challenges of using TCAD tools in the IC foundry is also discussed.