Ar Sputter-Etching of YIG and Ta2O5 and Fabrication of Artificial Anisotropic Waveguides with YIG Thin Films

Tetsuya MIZUMOTO  Yoshiyuki NAITO 

Publication
IEICE TRANSACTIONS (1976-1990)  Vol.E67  No.2  pp.84-87
Publication Date: 1984/02/20
Online ISSN: 
Print ISSN: 0000-0000
Type of Manuscript: PAPER
Category: Optical and Quantum Electronics
Keyword: 


Full Text: PDF(435.3KB)

Summary: 
A microfabrication technique using a sputter-etching with Ar, including the process of a mask formation, is described. A Ti etch resistant mask was formed by using a lift-off technique following an electron beam exposure lithography. The sputter-etch rate of YIG, Ta2O5, Ti and Al were determined. Grating patterns with fairly deep grooves were fabricated on YIG and Ta2O5 successfully.