Keyword : variable-shaped beam

Character-Size Optimization for Reducing the Number of EB Shots of MCC Lithographic Systems
Makoto SUGIHARA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2010/05/01
Vol. E93-C  No. 5  pp. 631-639
Type of Manuscript: Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Manufacturing Technology
Keyword: 
maskless lithography,  character projection,  variable-shaped beam,  multi-column-cell system,  character size optimization,  EB shots, 
  Summary |  Full Text:PDF
Character Projection Mask Set Optimization for Enhancing Throughput of MCC Projection Systems
Makoto SUGIHARA  Yusuke MATSUNAGA  Kazuaki MURAKAMI 
Publication:   IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences
Publication Date: 2008/12/01
Vol. E91-A  No. 12  pp. 3451-3460
Type of Manuscript: Special Section PAPER (Special Section on VLSI Design and CAD Algorithms)
Category: Physical Level Design
Keyword: 
maskless lithography,  multi-column-cells,  character projection,  variable-shaped beam,  throughput, 
  Summary |  Full Text:PDF
Technology Mapping Technique for Increasing Throughput of Character Projection Lithography
Makoto SUGIHARA  Kenta NAKAMURA  Yusuke MATSUNAGA  Kazuaki MURAKAMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2007/05/01
Vol. E90-C  No. 5  pp. 1012-1020
Type of Manuscript: Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Lithography-Related Techniques
Keyword: 
maskless lithography,  character projection,  variable-shaped beam,  technology mapping,  throughput, 
  Summary |  Full Text:PDF