Keyword : oxygen

Study on Surface Characteristic of the Copper Nitride Films by Absorbed Oxygen
Musun KWAK  Jongho JEON  Kyoungri KIM  Yoonseon YI  Sangjin AN  Donsik CHOI  Youngseok CHOI  Kyongdeuk JEONG 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2012/11/01
Vol. E95-C  No. 11  pp. 1744-1748
Type of Manuscript: Special Section PAPER (Special Section on Electronic Displays)
Category: INVITED
Keyword: 
copper nitride,  weak boundary layer,  oxygen,  atmospheric pressure plasma,  excimer ultraviolet,  XPS,  AFM, 
  Summary |  Full Text:PDF
SIMOX Wafers Having Low Dislocation Density Formed with a Substoichiometric Dose of Oxygen
Sadao NAKASHIMA  Katsutoshi IZUMI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1992/12/20
Vol. E75-C  No. 12  pp. 1415-1420
Type of Manuscript: Special Section PAPER (Special Issue on SOI (Si on Insulator) Devices)
Category: SOI Wafers
Keyword: 
SIMOX,  implantation,  dislocation,  oxygen,  SOI, 
  Summary |  Full Text:PDF