Keyword : electron beam


Cell Library Development Methodology for Throughput Enhancement of Character Projection Equipment
Makoto SUGIHARA Taiga TAKATA Kenta NAKAMURA Ryoichi INANAMI Hiroaki HAYASHI Katsumi KISHIMOTO Tetsuya HASEBE Yukihiro KAWANO Yusuke MATSUNAGA Kazuaki MURAKAMI Katsuya OKUMURA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2006/03/01
Vol. E89-C  No. 3 ; pp. 377-383
Type of Manuscript:  Special Section PAPER (Special Section on VLSI Design Technology in the Sub-100 nm Era)
Category: CAD
Keyword: 
cell librarycharacter projectionelectron beamEB shotsthroughputoptimizationinteger linear programming
 Summary | Full Text:PDF(427.7KB)

Visibility Evaluation of the Inverse-Phase CRT Raster Moire Pattern
Naoki SHIRAMATSU Shuji IWATA Takumi MINEMOTO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 2000/10/25
Vol. E83-C  No. 10 ; pp. 1594-1601
Type of Manuscript:  Special Section PAPER (Special Issue on Electronic Displays)
Category: 
Keyword: 
cathode ray tubemoire patternelectron beamshadow maskimage simulation
 Summary | Full Text:PDF(736.3KB)

An Evaluation Method for CRT Moire Patterns by Visibility Estimation and Image Simulation
Naoki SHIRAMATSU Shuji IWATA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1997/08/25
Vol. E80-C  No. 8 ; pp. 1095-1100
Type of Manuscript:  Special Section PAPER (Special Issue on Advanced Emissive Displays)
Category: 
Keyword: 
cathode ray tubemoire patternelectron beamshadow maskimage simulation
 Summary | Full Text:PDF(636.2KB)

High Speed Electron Beam Cell Projection Exposure System
Yoshihiko OKAMOTO Norio SAITOU Haruo YODA Yoshio SAKITANI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3 ; pp. 445-452
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
cell projectionelectron beamlithographymask processexposure data
 Summary | Full Text:PDF(798.6KB)

Material Representations and Algorithms for Nanometer Lithography Simulation
Edward W. SCHECKLER Taro OGAWA Shoji SHUKURI Eiji TAKEDA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/02/25
Vol. E77-C  No. 2 ; pp. 98-105
Type of Manuscript:  Special Section PAPER (Special Issue on 1993 VLSI Process and Device Modeling Workshop (VPAD 93))
Category: Process Simulation
Keyword: 
lithography simulationpattern fluctuation PMMASAL-601electron beam
 Summary | Full Text:PDF(766.7KB)

Real-Time Feed-Forward Control LSIs for a Direct Wafer Exposure Electron Beam System
Hironori YAMAUCHI Tetsuo MOROSAWA Takashi WATANABE Atsushi IWATA Tsutomu HOSAKA 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/01/25
Vol. E76-C  No. 1 ; pp. 124-135
Type of Manuscript:  PAPER
Category: Integrated Electronics
Keyword: 
asicpipelineadaptiveelectron beam
 Summary | Full Text:PDF(1.1MB)