IEICE TRANSACTIONS on Electronics

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Volume E75-C No.7  (Publication Date:1992/07/25)
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Special Issue on Ultra Clean Technology

pp.755-756  FOREWORD
FOREWORD
Tadahiro OHMI  
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pp.757-763  PAPER
Initial Stage of SiO2/Si Interface Formation on Si(111) Surface
Hiroshi NOHIRA  Yoshinari TAMURA  Hiroki OGAWA  Takeo HATTORI  
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pp.764-769  PAPER
Native Oxide Growth on Hydrogen-Terminated Silicon Surfaces
Tatsuhiro YASAKA  Masaru TAKAKURA  Kenichi SAWARA  Shigeo UENAGA  Hiroshi YASUTAKE  Seiichi MIYAZAKI  Masataka HIROSE  
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pp.770-773  PAPER
Reaction of H-Terminated Si(100) Surfaces with Oxidizer in the Heating and Cooling Process
Norikuni YABUMOTO  Yukio KOMINE  
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pp.774-780  PAPER
Chemical Structures of Native Oxides Formed during Wet Chemical Treatments of Silicon Surfaces
Hiroki OGAWA  Takeo HATTORI  
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pp.781-789  PAPER
Synchrotron Radiation Stimulated Evaporation of a-SiO2 Films and Its Application for Si Surface Cleaning
Housei AKAZAWA  Yuichi UTSUMI  Jun-ichi TAKAHASHI  Tsuneo URISU  
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pp.790-795  PAPER
The Effect of Chemical Cleaning on Bulk Traps in Dry Gate Oxide
Hidetsugu UCHIDA  Norio HIRASHITA  Tsuneo AJIOKA  
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pp.796-799  PAPER
Effects of Cleaning by Sulfuric Acid and Hydroperoxide Mixture on Thin SiO2 Film Properties
Masashi MAEKAWA  Shigeo OHNISHI  Keizo SAKIYAMA  
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pp.800-808  PAPER
Influence of Vacancy in Silicon Wafer of Various Types on Surface Microroughness in Wet Chemical Process
Tadahiro OHMI  Toshihito TSUGA  Jun TAKANO  Masahiko KOGURE  Koji MAKIHARA  Takayuki IMAOKA  
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pp.809-811  PAPER
Evaluation of Si Surface Micro-Roughness by Measuring Chlorine Concentration and Total Charge of Native Oxide
Ichiro OKI  Tetsuo BIWA  Jun KUDO  Hikou SHIBAYAMA  
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pp.812-815  PAPER
A New Cleaning Solution for Metallic Impurities on the Silicon Wafer Surface
Tsugio SHIMONO  Mikio TSUJI  
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pp.816-828  PAPER
The Segregation and Removal of Metallic Impurities at the Interface of Silicon Wafer Surface and Liquid Chemicals
Takashi IMAOKA  Takehiko KEZUKA  Jun TAKANO  Isamu SUGIYAMA  Tadahiro OHMI  
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pp.829-833  PAPER
Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning
Rinshi SUGINO  Yoshiko OKUI  Masaki OKUNO  Mayumi SHIGENO  Yasuhisa SATO  Akira OHSAWA  Takashi ITO  
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pp.834-838  PAPER
Plasmaless Dry Etching of Silicon Nitride Films with Chlorine Trifluoride Gas
Yoji SAITO  Masahiro HIRABARU  Akira YOSHIDA  
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pp.839-843  PAPER
Plasma-Parameter-Extraction for Minimizing Contamination and Damage in RIE Processes
Takeo YAMASHITA  Satoshi HASAKA  Iwao NATORI  Tadahiro OHMI  
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pp.844-851  PAPER
Optimization of Photolithography Developing Process without Residual Surfactant on Surfaces
Hisayuki SHIMADA  Shigeki SHIMOMURA  Kouichi HIROSE  Masanobu ONODERA  Tadahiro OHMI  
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pp.852-859  PAPER
2D Simulation of Particle Formation, Growth, and Deposition in Low-Pressure CVDs: Application of CONTAMINATE Version 2.0
Evan WHITBY  Koichi TSUZUKI  
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pp.860-865  PAPER
Contamination Control in Low-Pressure Process Equipment
Koichi TSUZUKI  
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