Barrier Metal Effect on Electro- and Stress-Migration Tetsuaki WADA
Publication: IEICE TRANSACTIONS on Fundamentals of Electronics, Communications and Computer Sciences Publication Date: 1994/01/20 Vol. E77-ANo. 1pp. 180-186 Type of Manuscript: Special Section PAPER (Special Section on Reliability) Category: Failure Physics and Failure Analysis Keyword: semiconductor,
metal,
barrier metal,
reliability electromigration,
stress-migration,