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Takashi ITO
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Improvement of ArF Photo Resist Pattern by VUV Cure Hisakazu MIYATAKE
Takashi ITO
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Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2007/05/01
Vol. E90-C
No. 5
pp. 1006-1011
Type of Manuscript: Special Section PAPER (Special Section on Fundamentals and Applications of Advanced Semiconductor Devices)
Category: Lithography-Related Techniques Keyword: UV cure,
ArF,
resist,
dry etching resistance,
LER,
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Sequential Dry Cleaning System for Highly-Controlled Silicon Surfaces Takashi ITO
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Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1996/03/20
Vol. E79-C
No. 3
pp. 375-381
Type of Manuscript: Special Section PAPER (Special Issue on Scientific ULSI Manufacturing Technology)
Category: High-Performance Processing Keyword: ULSI,
clean surface,
native oxide,
photo-excitation,
hydrogen termination,
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FOREWORD Takashi ITO
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Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1992/12/20
Vol. E75-C
No. 12
pp. 1413-1414
Type of Manuscript: FOREWORD
Category: Keyword:
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(81.2KB)
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FOREWORD Takashi ITO
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Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 1991/06/20
Vol. E74-C
No. 6
pp. 1607-1608
Type of Manuscript: FOREWORD
Category: Keyword:
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