Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2009/12/01
Vol. E92-C
No. 12
pp. 1523-1530
Type of Manuscript: PAPER
Category: Semiconductor Materials and Devices
Keyword:
MOS capacitors,
Si-implantation,
thermal oxide,
I-V hysteresis,
hysteresis window,
nonvolatile memory,
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