Kazuhiko TSUJI

Evaluation of Plasma Damage to Gate Oxide
Yukiharu URAOKA  Koji ERIGUCHI  Tokuhiko TAMAKI  Kazuhiko TSUJI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/20
Vol. E77-C  No. 3  pp. 453-458
Type of Manuscript: Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
QBD,  gate oxide,  plasma,  reliability,  damage,  photon emission,  LOCOS,  thinning, 
  Summary |  Full Text:PDF
A New Technique for Evaluating Gate Oxide Reliability Using a Photon Emission Method
Yukiharu URAOKA  Kazuhiko TSUJI 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1993/04/20
Vol. E76-C  No. 4  pp. 519-524
Type of Manuscript: Special Section PAPER (Special Issue on Sub-Half Micron Si Device and Process Technologies)
Category: Device Technology
Keyword: 
reliability,  photon emission,  TDDB,  gate oxide,  LOCOS, 
  Summary |  Full Text:PDF