Hiroyuki KAWAHARA


Removal of Particles on Si Wafers in SC-1 Solution
Hiroyuki KAWAHARA Kenji YONEDA Izumi MUROZONO Yoshihiro TODOKORO 
Publication:   IEICE TRANSACTIONS on Electronics
Publication Date: 1994/03/25
Vol. E77-C  No. 3  pp. 492-497
Type of Manuscript:  Special Section PAPER (Special Issue on Quarter Micron Si Device and Process Technologies)
Category: Process Technology
Keyword: 
particleSC-1 solutionetchingVan der Waals forcecleaning
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