Publication: IEICE TRANSACTIONS on Electronics
Publication Date: 2000/08/20
Vol. E83-C
No. 8
pp. 1259-1266
Type of Manuscript: Special Section PAPER (Special Issue on 1999 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD'99))
Category: Process Modeling and Simulation
Keyword:
ion implantation,
three-dimensional,
Monte-Carlo,
analytical,
simulation,
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